Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation

The presented study compares the structure of hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDSN) plasma polymer thin films with a thickness about 30 nm before after oxidation process, focusing on analysis porosity correlated electrolyte up-take in formed films. results illustrate that treatment converts HMDSO HMDSN progressively into SiOx-like However, underlying mechanism etching CxHy groups condensation intermediate Si-OH leads to highly porous studies show differences chemical nanoporosity as measured by spectroscopic techniques could be resulting electrolytes open pores